Toward a better understanding of the nanoscale degradation mechanisms of ultra-thin Si0 2 /Si films: Investigation of the best experimental conditions with a conductive-atomic force microscope - Université Claude Bernard Lyon 1 Accéder directement au contenu
Article Dans Une Revue Journal of Applied Physics Année : 2011

Toward a better understanding of the nanoscale degradation mechanisms of ultra-thin Si0 2 /Si films: Investigation of the best experimental conditions with a conductive-atomic force microscope

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Electronique
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Dates et versions

hal-01632428 , version 1 (10-11-2017)

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R. Arinero, W. Hourani, Antoine Touboul, B. Gautier, M. Ramonda, et al.. Toward a better understanding of the nanoscale degradation mechanisms of ultra-thin Si0 2 /Si films: Investigation of the best experimental conditions with a conductive-atomic force microscope. Journal of Applied Physics, 2011, 110 (1), ⟨10.1063/1.3603037⟩. ⟨hal-01632428⟩
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